Temperature tuning by emissivity variation on susceptor by laser patterning

TW202639901APending Publication Date: 2026-10-01APPLIED MATERIALS INC
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Patent Information

Application Number
TW114136915
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-04
Filing Date
2025-09-25
Publication Date
2026-10-01

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Abstract

An apparatus, a method, and system for temperature tuning by emissivity variation on susceptor by laser patterning. In an embodiment, a method for performing laser patterning on a chamber component of a processing chamber is provided. The method includes receiving a chamber component of a processing chamber and performing laser patterning on one side of the chamber component of the processing chamber to form a plurality of patterned regions and a non-patterned region. The plurality of patterned regions having a different emissivity than the non-patterned region.
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