Methods for controlling the movement of magnetrons, electronic devices, and readable storage media

TW202639904APending Publication Date: 2026-10-01ADVANCED MICRO FAB EQUIP INC CHINA
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Patent Information

Application Number
TW115107238
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-19
Filing Date
2026-02-26
Publication Date
2026-10-01

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Abstract

This invention discloses a method for controlling the motion of a magnetron, an electronic device, and a readable storage medium, applied to a magnetron sputtering source. The magnetron sputtering source includes a magnetron and a driving device. The driving device controls the magnetron's rotation and revolution around the center of the target material to periodically scan the entire target area. The revolution and rotation angular velocities of the magnetron are varied to ensure that the magnetron's trajectory does not overlap within one motion cycle. This invention can achieve efficient utilization of the target material and uniformity of the thin film thickness by optimizing the magnetron's trajectory and magnetic field distribution.
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