Membrane deposition apparatus and method for use in membrane deposition apparatus

TW202639919APending Publication Date: 2026-10-01ACM RES (SHANGHAI) INC +3
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114119108
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-21
Filing Date
2025-05-21
Publication Date
2026-10-01

Smart Images

  • Figure TWG2TA001078159_001
    Figure TWG2TA001078159_001
  • Figure TWG2TA001078159_002
    Figure TWG2TA001078159_002
  • Figure TWG2TA001078159_003
    Figure TWG2TA001078159_003
Patent Text Reader

Abstract

This disclosure provides a method for a membrane material deposition apparatus. The membrane material deposition apparatus includes multiple stations, and the method includes: step S1: providing a substrate to at least two of the multiple stations; step S2: simultaneously depositing membrane material onto each substrate; step S3: transferring each substrate from the current station to another station; step S4: simultaneously depositing membrane material onto each substrate; step S5: repeating steps S3 to S4 until N membrane depositions are completed; the membrane material used in the N membrane depositions is the same.
Need to check novelty before this filing date? Find Prior Art