High temperature face plate for deposition application

TW202639932APending Publication Date: 2026-10-01APPLIED MATERIALS INC
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Patent Information

Application Number
TW115122604
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-06-17
Filing Date
2021-05-28
Publication Date
2026-10-01

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Abstract

Embodiments of the disclosure relate to faceplates for a processing chamber. In one example, a faceplate includes a body having a plurality of apertures formed therethrough. A heating element is disposed within the body, and the heating element circumscribes the plurality of apertures. A support ring is disposed in the body. The support ring circumscribes the heating element. The support ring includes a main body and a cantilever extending radially inward from the main body. The cantilever contacts the body of the faceplate.
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