Method for metal ion removal and metal ion removal systems

TW202639945APending Publication Date: 2026-10-01TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD +1
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Patent Information

Application Number
TW114135480
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-07-18
Filing Date
2025-09-16
Publication Date
2026-10-01

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Abstract

A metal ion removal method includes providing an aqueous solution comprising one or more dissolved metal ions; partially neutralizing the aqueous solution by adding a first alkaline agent to adjust a pH of the aqueous solution toward a first target range; after partially neutralizing the aqueous solution, introducing the aqueous solution into a crystallization chamber; introducing a second alkaline agent into the crystallization chamber; recirculating the aqueous solution within the crystallization chamber; inducing a crystallization of metal-based solids from the aqueous solution within the crystallization chamber.
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