Multiwavelength measurements for scanning overlay metrology
TW202640101APending Publication Date: 2026-10-01KLA CORP
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Patent Information
- Application Number
- TW114119579
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-16
- Filing Date
- 2025-05-26
- Publication Date
- 2026-10-01
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Figure TWG2TA001078164_001 
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Abstract
A metrology system and method for imaging samples such as semiconductor devices having metrology targets for measuring overlay. In embodiments, the system includes an illumination source configured to generate a multiwavelength illumination beam, collection channels for collecting wavelength-selective collected light from the sample in accordance with a metrology recipe, and a controller configured to receive wavelength-selective datasets and determine at least one overlay measurement from the wavelength-selective datasets received.
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