Electron beam application devices and their control methods

Abstract

An electron beam application device and its control method are disclosed. The device comprises: a first light source emitting a first excitation light that is a pulsed excitation light; a photocathode emitting a first pulsed electron beam by irradiating the first excitation light; an objective lens focusing the first pulsed electron beam; a detector detecting signal electrons emitted from a sample by irradiating the first pulsed electron beam; a control unit controlling the various components; and a second light source emitting a second excitation light with a pulsed excitation light different from the first excitation light. The control method further comprises the second light source emitting the second excitation light with a pulsed excitation light different from the first excitation light, and the control unit irradiating the sample with the second pulsed electron beam emitted from the photocathode by irradiating the second excitation light at a timing different from that of the first pulsed electron beam.

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