Reflective photomask substrate, reflective photomask, and manufacturing method of reflective photomask

Abstract

This invention provides a reflective photomask substrate that is less prone to leaving defects originating from foreign matter after a cleaning process. The present invention is a reflective photomask substrate comprising, in sequence, a substrate, a multilayer reflective film for reflecting EUV light, and an absorber film, wherein at least one of the two main surfaces of the reflective photomask substrate is coated with a carbonyl compound having 4 to 8 carbon atoms.

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