Decision-making methods and exposure methods

TW202640306APending Publication Date: 2026-10-01NIKON CORP
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Patent Information

Application Number
TW114149063
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-17
Filing Date
2025-12-15
Publication Date
2026-10-01

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Abstract

The exposure method of the present invention is an exposure method using an exposure apparatus comprising: a plurality of modules; and a stage capable of holding a substrate and movable in a first direction and a second direction. The exposure method comprises the following steps: in a first period, while irradiating a first region with light from a first module and blocking illumination light directed toward a plurality of elements of a spatial light modulator of a second module by a shutter of a second module, the substrate is moved in a second direction and moved in the first direction by a distance shorter than a first arrangement spacing while moving the first module above the first region and moving the second module above the second region; in a second period, while irradiating a second region with light from a first module and blocking illumination light directed toward a plurality of elements of a spatial light modulator of a second module by a shutter of a second module, the substrate is moved in a second direction and moved in the first direction by a distance shorter than a first arrangement spacing while moving the first module above the second region. none
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