Exposure apparatus and exposure method

Abstract

A technique is provided that can shorten computation time when correcting data of an exposed pattern. The exposure apparatus 1 includes a second stage 25, an exposure head 41, a second moving mechanism 27, a memory 73, a conversion processing unit 711, and a correction processing unit 713. The second stage 25 holds a substrate W. The exposure head 41 emits light onto the substrate W. The second moving mechanism 27 moves the second stage 25 relative to the exposure head 41. The memory 73 stores first exposure data D1 of the exposed pattern. The conversion processing unit 711 converts the first exposure data D1 into second exposure data D2, which includes vector data and raster data. The correction processing unit 713 corrects the second exposure data D2.

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