Apparatus and methods for removing photoresist and polymer coatings

TW202640314APending Publication Date: 2026-10-01YIELD ENGINEERING SYSTEMS INC
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Patent Information

Application Number
TW114148726
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-12
Filing Date
2025-12-11
Publication Date
2026-10-01

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Abstract

A system for removing polymeric coatings from substrates includes a wet processing tank capable of holding a liquid chemical. The tank is configured to accommodate at least one substrate with a polymer-coated surface, ensuring that at least part of the coating is immersed in the chemical. Additionally, the system features multiple nozzles positioned within the tank, also immersed in the chemical, which are designed to spray fluid streams of the chemical onto the substrate’s surface to facilitate the removal of the polymeric coating.
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