Semiconductor device, and method of manufacturing semiconductor device
TW202641059APending Publication Date: 2026-10-01RAPIDUS CORP
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Patent Information
- Application Number
- TW114145342
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-07-11
- Filing Date
- 2025-11-20
- Publication Date
- 2026-10-01
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Abstract
A semiconductor device includes: a third nanometer-sized transistor adjacent to a first nanometer-sized transistor; a non-element region deposited on the third nanometer-sized transistor and adjacent to a second nanometer-sized transistor; and a second insulating layer formed between the third nanometer-sized transistor and the non-element region, separating the third nanometer-sized transistor and the non-element region. The non-element region includes: a second gate electrode shared with the third nanometer-sized transistor; and at least one of a semiconductor layer connecting the source / drain regions.
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