Semiconductor devices
TW202641080APending Publication Date: 2026-10-01SEMICON ENERGY LAB CO LTD
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Patent Information
- Application Number
- TW115121857
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2016-01-18
- Filing Date
- 2016-05-20
- Publication Date
- 2026-10-01
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Abstract
A metal oxide film including crystalline portions is provided. Furthermore, a metal oxide film with high physical property stability is provided. Additionally, a metal oxide film with improved electrical properties is provided. Furthermore, a metal oxide film that can improve field-effect mobility is provided. A metal oxide film comprising In, M (M being Al, Ga, Y, or Sn), and Zn is provided, the metal oxide film including a first crystalline portion and a second crystalline portion, the first crystalline portion having c-axis alignment, the second crystalline portion not having c-axis alignment, and the presence proportion of the second crystalline portion being higher than that of the first crystalline portion.
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