Substrate with molybdenum nitride film and method for manufacturing the substrate

TW202641184APending Publication Date: 2026-10-01CENT GLASS CO LTD
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Patent Information

Application Number
TW114146432
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-05
Filing Date
2025-11-27
Publication Date
2026-10-01

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Abstract

This invention provides a method for manufacturing a substrate that suppresses damage to the substrate and has a molybdenum nitride film with a low impurity concentration. The invention relates to a substrate manufacturing method comprising a film-forming step of supplying a gas containing gaseous MoOF4 and a gas containing a first reducing agent that is gaseous and contains nitrogen atoms to the substrate, and forming a molybdenum nitride film on the substrate.
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