Laser heating to adjust substrate warpage

TW202641216APending Publication Date: 2026-10-01APPLIED MATERIALS INC
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Patent Information

Application Number
TW114137888
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-28
Filing Date
2025-10-01
Publication Date
2026-10-01

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Abstract

Embodiments described herein relate to a method that includes ‎forming a dielectric layer over a backside surface of a substrate, where the ‎backside surface is opposite from a device layer on the substrate, and mapping ‎a distortion of the substrate. In an embodiment, the method further includes ‎irradiating a portion of the dielectric layer with a laser to locally modify the ‎dielectric layer, where the dielectric layer has a first modulus and a modified ‎portion of the dielectric layer has a second modulus that is different than the first ‎modulus.‎
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