Substrate processing apparatus and substrate processing method

TW202641226APending Publication Date: 2026-10-01SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
TW115106718
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-13
Filing Date
2026-02-25
Publication Date
2026-10-01

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Abstract

The substrate processing apparatus of the present invention includes: at least one processing liquid nozzle that sprays processing liquid onto the substrate isotropically; and a UV lamp that emits ultraviolet light that should irradiate at least one processing liquid nozzle.
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