Substrate cleaning apparatus, substrate cleaning method and control program

Abstract

This substrate cleaning apparatus improves the processing efficiency of substrate cleaning while suppressing substrate damage or backcontamination from the cleaning body. An embodiment of the substrate cleaning apparatus includes: a holding unit for holding the substrate; a supply unit for supplying cleaning liquid to the surface to be treated of the substrate; a cleaning unit for cleaning the surface to be treated by contacting the cleaning body; a measuring unit for measuring the amount of particles contained in the cleaning liquid discharged from the surface to be treated; and a control unit for controlling the contact load applied by the cleaning body to the surface to be treated based on the measured amount of particles.

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