Substrate processing apparatus and substrate processing method

Abstract

The purpose of this disclosure is to improve the yield of the product. The substrate processing apparatus includes a control unit that, in cooperation with a memory, performs the following control: (1) immersing the substrate in a processing liquid stored in a processing tank; (2) setting the chamber to an organic solvent gas atmosphere; (3) supplying the organic solvent gas to a region including the contact position between the elevator and the substrate while the substrate is lifted from the processing tank; and (4) supplying the organic solvent gas to the region including the contact position between the elevator and the substrate while the chamber is depressurized, and continuing this supply for a predetermined time.

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