Cleaning method of reaction chamber used in semiconductor or display process
TW202641234APending Publication Date: 2026-10-01SK MATERIALS CO LTD
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Patent Information
- Application Number
- TW115111455
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-26
- Filing Date
- 2026-03-25
- Publication Date
- 2026-10-01
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Abstract
The present invention relates to a method for cleaning a reaction chamber used in semiconductor or display processes, the method comprising cleaning residues present in at least a portion of the reaction chamber using a cleaning gas containing FNO gas, wherein the residues include one or more of a silicon nitride film, a silicon oxide film, and an amorphous carbon film.
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