Furnace tube equipment

Abstract

This application discloses a furnace tube device, relating to the field of semiconductor manufacturing equipment. The furnace tube device includes: a process tube, the interior of which forms a process zone; a flange, disposed below the process tube, for supporting the process tube; a crystal boat, for supporting multiple substrates; and a sealing cover, disposed below the crystal boat and the flange. The sealing cover includes an air inlet channel and a purging section. The air inlet channel has an inlet end and an outlet end. The inlet end receives incoming air, and the outlet end communicates with the purging section. The purging section has multiple air holes facing the process zone and is located close to the flange. Continuous gas purging can significantly reduce particle deposition on the surfaces of the flange and the sealing cover, thereby reducing the risk of contamination, optimizing the cleanliness of the process environment, and reducing the cleaning frequency of the flange and the sealing cover.

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