vacuum drying device

Abstract

This invention provides a vacuum drying apparatus that can uniformize the vacuum drying interval within the substrate surface, thereby suppressing uneven drying of the coated film. The vacuum drying apparatus includes: a top plate having an opposing surface facing the upper surface of a substrate supported by a substrate support; a top plate lifting unit that, within a processing space, moves the top plate between a position below the opposing surface near the upper surface of the substrate supported by the substrate support and an upper position further above the lower position; and a plurality of pressing pins mounted on the opposing surface, which, when the top plate is in the lower position, abut against the peripheral region of one of the main surfaces to correct substrate warping. This allows the distance (vacuum drying interval) between the corrected upper surface of the substrate and the opposing surface to be uniform within the substrate surface.

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