Substrate processing device

Abstract

The present invention provides a substrate processing apparatus that can prevent substrate breakage under high-pressure cleaning and reduce substrate transport defects. The cleaning apparatus includes: a conveying mechanism for conveying the substrate; and a high-pressure nozzle for spraying fluid at high pressure from above the substrate conveyed by the conveying mechanism. Among the plurality of conveying rollers of the conveying mechanism, the opposing roller (22) which is the conveying roller positioned opposite to the high-pressure nozzle has a rotation axis (22a) and a plurality of roller members (22b) installed with gaps between them along the rotation axis. The width dimension of the roller members in the direction extending along the rotation axis is greater than the width dimension of the gaps.

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