Substrate processing device

Abstract

This invention discloses the formation of a thin and high-quality interfacial layer (IL). The substrate processing apparatus includes: a plurality of processing units that perform specific processing on substrates; a first transfer robot that transfers the substrate between a receiving container held by the holding unit and a transfer section; and a second transfer robot that transfers the substrate between the transfer section and the processing units; and each processing unit includes: a processing liquid supply unit that supplies an oxidizing processing liquid to the surface of the substrate; a heating unit that heats the substrate after processing by the processing liquid supply unit using a flash lamp; and a cooling unit that cools the substrate heated by the heating unit.

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