Electrostatic chuck with top surface pattern for temperature uniformity
TW202641286APending Publication Date: 2026-10-01LAM RES CORP
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Patent Information
- Application Number
- TW114144394
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-15
- Filing Date
- 2025-11-14
- Publication Date
- 2026-10-01
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Figure TWG2TA001078497_001 
Figure TWG2TA001078497_002 
Figure TWG2TA001078497_003
Abstract
An electrostatic chuck includes a baseplate and a ceramic plate attached by a bonding layer to the baseplate. The ceramic plate includes a first annular seal band arranged adjacent to a radially outer edge of the ceramic plate; and a second annular seal band arranged radially inwardly from the first annular seal band. The first annular seal band and the second annular seal band define an outer cooling gas zone. A plurality of contact pads is arranged between the first annular seal band and the second annular seal band. A first plurality of cooling gas grooves is arranged between the plurality of contact pads, between first ones of the plurality of contact pads and the first annular seal band, and between second ones of the plurality of contact pads and the second annular seal band.
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