electrostatic chuck device
TW202641288APending Publication Date: 2026-10-01SUMITOMO OSAKA CEMENT CO LTD
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Patent Information
- Application Number
- TW115108239
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-19
- Filing Date
- 2026-03-06
- Publication Date
- 2026-10-01
Smart Images
Figure TWG2TA001079467_001 
Figure TWG2TA001079467_002 
Figure TWG2TA001079467_003
Abstract
An electrostatic chuck device includes: an electrostatic chuck portion; and a base portion supporting the electrostatic chuck portion. A refrigerant flow path is provided inside the base portion. The refrigerant flow path has: a first flow path portion radially located on the outermost side and having an inlet for refrigerant fluid to flow into; a second flow path portion radially located on the innermost side; and a third flow path portion radially located between the first and second flow path portions and having an outlet for refrigerant fluid to flow out. The first flow path portion has: a first outer flow path portion extending circumferentially from the inlet; a first inner flow path portion spaced radially inward relative to the first outer flow path portion; and a first connecting flow path portion connecting the first outer flow path portion and the first inner flow path portion.
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