Method for enhanced defective die classification and early wafer yield detection

TW202641295APending Publication Date: 2026-10-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW115106988
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-27
Filing Date
2026-02-26
Publication Date
2026-10-01

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Abstract

A method to generate an inspection tool sampling plan is disclosed. More, particularly, a method to generate an inspection tool sampling plan for more accurate die loss projection assuming non-uniform defect density or distribution on a wafer is disclosed. More, particularly, a method to generate an inspection tool sampling plan for more accurate die loss projection using a machine learning defective die prediction model is disclosed. A method to optimize an inspection tool sampling plan is disclosed. More particularly, a method of optimizing a wafer region definition and sampling budget distribution for improved die loss projection without relying on rule-based threshold prediction models based on defect counts is disclosed. A computational probability prediction model, sampling plan optimizer, and defective die prediction model are disclosed to project die loss with improved accuracy and versatility to guide different wafers for inspection.
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