Semiconductor device and method of manufacturing semiconductor device
TW202641320APending Publication Date: 2026-10-01KIOXIA CORP
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Patent Information
- Application Number
- TW114131131
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-19
- Filing Date
- 2025-08-15
- Publication Date
- 2026-10-01
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Abstract
This invention provides a semiconductor device and a method for manufacturing the semiconductor device that improves the reliability of inter-wafer bonding. The semiconductor device of this embodiment includes: a first semiconductor element having a first dummy pattern and a first active pattern on its surface; and a second semiconductor element having a second dummy pattern on its surface facing the first dummy pattern and bonded to the first semiconductor element. The first dummy pattern includes a first region. The second dummy pattern includes a second region. The first region and the second region face each other. The size of the first region is larger than the average area of the pads included in the first active pattern. The pattern coverage of the first region is different from that of the second region.
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