Drawing method and drawing device

Abstract

The drawing method includes: generating drawing data including a wiring pattern and a code pattern representing an identification code of a device; and irradiating modulated light spatially modulated according to the drawing data to a substrate provided with a photosensitive resist film to draw the wiring pattern and the code pattern on the photosensitive resist film. The wiring pattern and the code pattern are drawn at positions not overlapping with each other on the photosensitive resist film. An exposure amount density of the modulated light irradiated onto the substrate is adjusted so that, among apertures formed by developing the photosensitive resist film, a maximum dimension in a depth direction of apertures corresponding to the code pattern is smaller than a maximum dimension in a depth direction of apertures corresponding to the wiring pattern.

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