Liquid source vaporization system
TW202641615APending Publication Date: 2026-10-16BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information
- Application Number
- TW115125170
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-07-14
- Filing Date
- 2024-07-12
- Publication Date
- 2026-10-16
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Abstract
This application provides a liquid source vaporization system applied to a semiconductor process equipment, including: a vaporization device, a liquid source pipeline, a blowing pipeline, a first control unit, an output pipeline, an exhaust gas treatment pipeline, and a second control unit; the first control unit is used to selectively control the blowing pipeline or the liquid source pipeline to connect to the vaporization device; the second control unit is used to selectively control the exhaust gas treatment pipeline or the output pipeline to connect to the vaporization device.
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