Plasma-based redox device and its method

TW202641631AInactive Publication Date: 2026-10-16NANO ELECTRONICS & MICRO SYST TECH
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Patent Information

Application Number
TW114113858
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-04-11
Publication Date
2026-10-16
Estimated Expiration
Not applicable · inactive patent

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Abstract

kHz is supplied to the electrode unit to generate an electric field within the reaction chamber. A mixed gas of nitrogen and hydrogen is introduced into the reaction chamber via the gas inlet. Under the influence of the electric field, the nitrogen gas is dissociated into plasma and high-energy ions. These high-energy ions collide with the hydrogen molecules, causing the hydrogen to dissociate into hydrogen ions. The resulting hydrogen ions are discharged from the plasma outlet and act upon the metal oxide material, where the hydrogen ions combine with the oxygen ions in the metal oxide material, thereby achieving the reduction of the metal oxide.
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