Plasma-based redox device and its method
TW202641631AInactive Publication Date: 2026-10-16NANO ELECTRONICS & MICRO SYST TECH
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Patent Information
- Application Number
- TW114113858
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-04-11
- Publication Date
- 2026-10-16
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
kHz is supplied to the electrode unit to generate an electric field within the reaction chamber. A mixed gas of nitrogen and hydrogen is introduced into the reaction chamber via the gas inlet. Under the influence of the electric field, the nitrogen gas is dissociated into plasma and high-energy ions. These high-energy ions collide with the hydrogen molecules, causing the hydrogen to dissociate into hydrogen ions. The resulting hydrogen ions are discharged from the plasma outlet and act upon the metal oxide material, where the hydrogen ions combine with the oxygen ions in the metal oxide material, thereby achieving the reduction of the metal oxide.
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