Method for manufacturing negative resist composition and resist pattern

Abstract

This invention provides a negative resist composition capable of forming well-shaped resist patterns. Furthermore, it provides a method for manufacturing resist patterns using this negative resist composition. This invention relates to a negative resist composition and a method for manufacturing resist patterns using this composition, wherein the negative resist composition comprises: a resin (A1) containing structural units represented by formula (a2-1) and formula (a2-4), an acid generator (B), a crosslinking agent (E), and an aromatic compound (I) with a molecular weight of 2000 or less and having three or more phenolic hydroxyl groups. [In formulas (a2-1) and (a2-4), Ra7 and Ra13 independently represent hydrogen atoms or methyl groups. Ra10 and Ra14 independently represent alkyl groups having 1 to 6 carbon atoms. Ra15 represents a hydrocarbon group having 1 to 12 carbon atoms. m1 represents any integer from 0 to 4. When m1 is 2 or more, multiple Ra10s may be the same or different. m2 represents any integer from 1 to 4.] Where the sum of m1 and m2 is 5 or less. m3 represents any integer from 0 to 4. When m3 is 2 or more, multiple Ra14s can be the same or different. m4 represents any integer from 1 to 4. When m4 is 2 or more, multiple Ra15s can be the same or different. Where the sum of m3 and m4 is 5 or less.

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