Photosensitive resin composition, cured material and substrate
TW202641912APending Publication Date: 2026-10-16TAIYO HOLDINGS CO LTD
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Patent Information
- Application Number
- TW115111412
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-26
- Filing Date
- 2026-03-25
- Publication Date
- 2026-10-16
Abstract
[Problem] To provide a photosensitive resin composition that maintains good defoaming properties and good hardening resolution even when the coating film is thickened. [Solution] A photosensitive resin composition comprising: a photosensitive resin, a thermosetting resin, a photopolymerization initiator, a filler, a defoamer, and a solvent; wherein, relative to the total amount of solvent contained in the aforementioned photosensitive resin composition, the content of solvents with a boiling point of 200-250°C at atmospheric pressure is 55% by mass or more; and the surface tension of the aforementioned photosensitive resin composition is 30-36 mN / m.
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