Acidic composition, its use and a process for cleaning substrates comprising tungsten or tungsten alloy

TW202641957APending Publication Date: 2026-10-16BASF SE
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Patent Information

Application Number
TW114149930
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-23
Filing Date
2025-12-18
Publication Date
2026-10-16

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Abstract

Described are an acidic composition, its use and a process for cleaning microelectronic substrates having a surface comprising tungsten or tungsten alloy.
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