Stripper composition and its use and method for stripping photoresist
TW202641958APending Publication Date: 2026-10-16ECHEM SOLUTIONS CORP
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Patent Information
- Application Number
- TW114113449
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-04-10
- Publication Date
- 2026-10-16
Abstract
A stripper composition, its use and a method for stripping photoresist are provided. The stripper composition includes an alkoxy diether organic solvent, an alcoholic organic solvent, an alkanolamine and an inorganic base. Based on
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