Methods to control delta bow of 3D NAND onon stack

TW202641999APending Publication Date: 2026-10-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW114139011
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-04-10
Filing Date
2025-10-09
Publication Date
2026-10-16

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Abstract

Embodiments of the present disclosure relate to apparatuses and methods of manufacturing layer stacks of ON layers that reduce or prevent anneal-induced structural changes of an ON stack. In at least some embodiments, a method for forming an oxide / nitride (ON) stack is provided and includes depositing a first material layer including silicon nitride and having a silicon-hydrogen bond (Si-H) content of about
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