Cold atmospheric pressure plasma-assisted aerosol deposition of metal oxides and application thereof
TW202642002APending Publication Date: 2026-10-16FENG CHIA UNIVERSITY
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Patent Information
- Application Number
- TW114112614
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-04-01
- Publication Date
- 2026-10-16
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Abstract
The invention successfully utilizes room-temperature atmospheric pressure plasma-assisted aerosol deposition technology to effectively deposit metal oxides electrochromic thin films. These films exhibit excellent visible (VIS), near-infrared (NIR) or dual-band transmittance properties, along with rapid color-switching response through efficient lithium-ion intercalation. The dual-band electrochromic thin films fabricated via room-temperature atmospheric pressure plasma-assisted aerosol deposition demonstrate outstanding electrochromic performance, fast switching speed, high stability, and manufacturing efficiency. This technology holds significant potential in the field of smart energy-saving windows and offers high-efficiency, low-cost energy-saving solutions for the construction and automotive industries.
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