Conveying system and diffusion furnace

Abstract

This application discloses a conveying system and a diffusion furnace, belonging to the field of semiconductor processing technology. In the conveying system, an inlet assembly extends axially along the process chamber of the diffusion furnace and communicates with the process chamber; in the inlet assembly, a second inlet pipe is sleeved outside the first inlet pipe, and a conveying gap is formed between the second inlet pipe and the first inlet pipe; the outlet ends of the first and second inlet pipes are both close to the furnace door of the diffusion furnace; one end of the first input pipe is connected to the process gas source, and the other end is connected to the inlet end of the first inlet pipe; the inlet end of the second inlet pipe is located on the side wall of the second inlet pipe and away from the furnace door. One end of the second input pipe is connected to a water source, and the other end is connected to the inlet end of the second inlet pipe.

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