Metrology platform systems for particulate size measurement and particulate counting

Abstract

A metrology platform method and system for particulate assessment, such as particulate location and size measurement on a particulate absorber, associated with a laser scanner source used for semiconductor manufacturing. According to an example embodiment, a camera and light arrangement is mounted to a motor driven arm that holds the camera and light at a moveable measurement distance from a particulate absorber attached to a platform for inspection. The camera captures high-resolution images with high contrast at one or more locations which are further processed by one or more image processing systems, controllers or modules to locate and count the number of particulates within the captured image of the particulate absorber. In addition, other image processing may be completed to determine other characteristics of the located particulates, including but not limited to, particulate size, particulate shape, particulate material, etc.

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