Surface film and surface layer and methods for manufacturing the above.

Abstract

This invention provides a surface film that, for example, suppresses uneven film thickness caused by localized surface protrusions even in photolithography under a monochromatic exposure light source, thereby enabling more uniform light transmission than before. A surface film is characterized in that it is formed on the surface of the aforementioned surface film, satisfying one or more of conditions (A) to (B) [condition (A) circumscribed circle diameter is 5 mm or more, condition (B) height is 2.5 μm or more], and the number of protrusions formed from the same composition as the aforementioned surface film is 5 or less per m².

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