Writing apparatus and adjusting method
TW202642276APending Publication Date: 2026-10-16SCREEN HOLDINGS CO LTD
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Patent Information
- Application Number
- TW115102286
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-26
- Filing Date
- 2026-01-21
- Publication Date
- 2026-10-16
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Figure TWG2TA001080993_001 
Figure TWG2TA001080993_002 
Figure TWG2TA001080993_003
Abstract
An adjustment method is used in a drawing apparatus for drawing a pattern on a substrate by means of light irradiation. The adjustment method includes the following steps: drawing a preliminary adjustment mark (921) on an auxiliary substrate; obtaining an image of the preliminary adjustment mark (921); obtaining an offset of the position of the preliminary adjustment mark (921); confirming whether the offset is within an allowable range; generating adjustment information if the offset is not within an allowable range; drawing a subsequent adjustment mark (922) on the auxiliary substrate while using the adjustment information; obtaining an image of the subsequent adjustment mark (922); obtaining an offset of the position of the subsequent adjustment mark (922); and confirming whether the offset is within an allowable range. The outer edge of the subsequent adjustment mark (922) is entirely located outside the preliminary adjustment mark (921), and at least a portion of the preliminary adjustment mark (921) overlaps with the subsequent adjustment mark (922). Adjusting method in a writing apparatus for writing a pattern on a substrate by irradiating the substrate with light, comprises a step of writing a preceding adjustmental mark (921) on a auxiliary substrate, a step of capturing an image of the preceding adjustmental mark (921), a step of obtaining a deviation amount of a position of the preceding adjustmental mark (921), a step of checking whether the deviation amount is within a tolerance, a step of generating adjustment information when the deviation is not within the tolerance, a step of writing a succeeding adjustmental mark (922) on the auxiliary substrate with using the adjustment information, a step of capturing an image of the succeeding adjustmental mark (922), a step of obtaining a deviation amount of a position of the succeeding adjustmental mark (922), and a step of checking whether the deviation amount is within the tolerance.A whole outer edge of the succeeding adjustmental mark (922) is positioned outside the preceding adjustmental mark (921), and at least part of the preceding adjustmental mark (921) overlaps with the succeeding adjustmental mark (922).
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