Processing apparatus and ion extraction optics for processing apparatus

Abstract

A processing apparatus may include a plasma chamber and an ion extraction optics, disposed on a side of the plasma chamber. The processing apparatus may further include a processing chamber, having a substrate holder, disposed opposite the ion extraction optics. The ion extraction optics may include an extraction plate, connected to the plasma chamber, and having an extraction aperture. The extraction optics may also include a beam blocker disposed adjacent to the extraction aperture, so as to define a set of extraction slits between the beam blocker and the extraction plate, and an electrode array, disposed along the beam blocker, and comprising a plurality of electrodes that are separately connectable to a voltage source.

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