Improved objective lens design for multi-beam charged particle beam system

TW202642561APending Publication Date: 2026-10-16CARL ZEISS MULTISEM GMBH
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Patent Information

Application Number
TW114147131
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-03
Filing Date
2025-12-02
Publication Date
2026-10-16

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Abstract

A multi-beam charged particle system with an improved lens design and an improved lens design for a multi-beam charged particle system is provided, which is configured for maintaining a high resolution at high throughput. The improved lens design can be applied for high throughput wafer inspection with multi-beam charged particle system.
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