Ion generation device and ion implantation device

TW202642568APending Publication Date: 2026-10-16SUMITOMO HEAVY IND MATERIAL SOLUTIONS CO LTD
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Patent Information

Application Number
TW115125108
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-10-08
Filing Date
2022-08-30
Publication Date
2026-10-16

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Abstract

The ion generating apparatus (10) comprises: an arc chamber (50); a magnetic field generator (52) that generates an axially applied magnetic field (B) in the internal space (S) of the arc chamber (50); a first cathode cover (72) that protrudes axially toward the interior of the arc chamber (50) and releases thermionic electrons toward the internal space (S); and a first thermal shield (76) comprising a first extension, a first front end portion, and a first front opening. The first extension extends axially in a cylindrical shape on the radially outer side of the first cathode cover (72) and is adjacent to the first cathode cover (72) in a radial direction orthogonal to the axial direction, separated by a gap. The first front end portion protrudes toward the interior of the arc chamber, and the first front opening opens axially at the first front end portion. The radial width of the first opening at the first front opening is less than the maximum radial width of the first cathode cover (72).
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