Semiconductor device including word line structures

Abstract

A semiconductor device includes a bit line configured to extend in a first direction; a word line structure configured to extend in a second direction, an active region having one side in contact with the bit line and configured to extend in a third direction, and a back gate configured to extend parallel to the word line structure. The word line structure includes a lower word line extending parallel to the back gate, an upper word line spaced apart from the lower word line in the third direction, and a vertical connection portion extending in the third direction while being in contact with both the lower word line and the upper word line.

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