Semiconductor device and method of making the same
TW202642817APending Publication Date: 2026-10-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information
- Application Number
- TW114136950
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-07-31
- Filing Date
- 2025-09-25
- Publication Date
- 2026-10-16
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Abstract
The gate structure of a planar transistor has two opposite sides that pass across an active region between two source / drain regions. The two opposite sides are not parallel to each other. As a result, the channel length between the two source / drain regions is not constant across the width of the gate structure. Put another way, multiple channels with different lengths are present between the two source / drain regions. This structure results in high subthreshold swing performance, which manifests as faster transition between the on / off states of the transistor.
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