Semiconductor devices

TW202642824APending Publication Date: 2026-10-16FLOSFIA
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Patent Information

Application Number
TW115127451
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-12-11
Filing Date
2021-12-10
Publication Date
2026-10-16

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Patent Text Reader

Abstract

One object of the present invention is to provide a structure for preventing hole injection into a gate insulating film. The semiconductor device of the present invention includes a gate insulating film, a hole blocking layer disposed in contact with the gate insulating film, and an oxide semiconductor layer disposed in contact with the hole blocking layer, wherein the hole blocking layer is disposed between the gate insulating film and the oxide semiconductor layer.
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