ESD / EOS protection device
TW202642861APending Publication Date: 2026-10-16UNITED MICROELECTRONICS CORP
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Patent Information
- Application Number
- TW114113554
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-04-10
- Publication Date
- 2026-10-16
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Figure TWG2TA001080228_003
Abstract
ESD / EOS protection devices are provided. The ESD / EOS protection device includes a fin structure of a semiconductor material over a semiconductor substrate, a first source / drain region in the fin structure, a second source / drain region in the fin structure, a gate structure over the fin structure and between the first source / drain region and the second source / drain region, a first dummy gate structure over the fin structure, a first doped region in the fin structure and between the first source / drain region and the second source / drain region, and a first doped layer under the first dummy gate structure and extending from the second source / drain region to the first doped region. A lower surface of the first doped layer is higher than a lower surface of the first doped region.
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