Plating apparatus, method for estimating the state within the plating apparatus, and computer program

TW202642918APending Publication Date: 2026-10-16EBARA CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115109152
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-14
Filing Date
2026-03-12
Publication Date
2026-10-16

Smart Images

  • Figure TWG2TA001081209_001
    Figure TWG2TA001081209_001
  • Figure TWG2TA001081209_002
    Figure TWG2TA001081209_002
  • Figure TWG2TA001081209_003
    Figure TWG2TA001081209_003
Patent Text Reader

Abstract

This invention provides a plating apparatus capable of accurately inferring the current density on a plating surface even when plating conditions change. The plating apparatus includes: a sensor configured to measure the potential of a plating solution near the outer edge of a substrate held by a substrate holder; and a state inferrer configured to calculate a state inference quantity representing the current density at the outer edge of the substrate, based on an observation model and a state transition model, using the measured potential as input. The state inferrer is configured to perform observation model-based computation using a first trained neural network model, which outputs an inference quantity representing the potential of the plating solution near the outer edge of the substrate if a state variable representing the current density at the outer edge of the substrate is input.
Need to check novelty before this filing date? Find Prior Art