Plating apparatus, method for estimating the state within the plating apparatus, and computer program
TW202642918APending Publication Date: 2026-10-16EBARA CORP
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Patent Information
- Application Number
- TW115109152
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-14
- Filing Date
- 2026-03-12
- Publication Date
- 2026-10-16
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Abstract
This invention provides a plating apparatus capable of accurately inferring the current density on a plating surface even when plating conditions change. The plating apparatus includes: a sensor configured to measure the potential of a plating solution near the outer edge of a substrate held by a substrate holder; and a state inferrer configured to calculate a state inference quantity representing the current density at the outer edge of the substrate, based on an observation model and a state transition model, using the measured potential as input. The state inferrer is configured to perform observation model-based computation using a first trained neural network model, which outputs an inference quantity representing the potential of the plating solution near the outer edge of the substrate if a state variable representing the current density at the outer edge of the substrate is input.
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