Cleaning equipment for substrate support components, substrate processing apparatus, and cleaning method for substrate support components.

TW202642944APending Publication Date: 2026-10-16TOKYO ELECTRON LTD
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Patent Information

Application Number
TW115104517
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-12
Filing Date
2026-02-05
Publication Date
2026-10-16

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    Figure TWG2TA001081074_003
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Abstract

This invention describes a cleaning fixture, a substrate processing apparatus, and a cleaning method for substrate support members that can effectively clean substrate support members. The cleaning fixture for substrate support members of this invention is a circular plate-shaped cleaning fixture for cleaning multiple substrate support members, and includes: a bottom surface comprising a central region including a central portion, and an annular outer region extending outward from the central region. The cleaning of the multiple substrate support members is performed by supplying cleaning fluid to the bottom surface while a portion of the multiple substrate support members supports the bottom surface. The outer region provides: at least one protrusion that a portion of the multiple substrate support members abuts against the bottom surface while a portion of the multiple substrate support members supports the bottom surface; and at least one recess that separates another portion of the multiple substrate support members from the bottom surface.
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