Cleaning unit in chemical mechanical polishing system

TW202642945APending Publication Date: 2026-10-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW115104532
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-05
Filing Date
2026-02-05
Publication Date
2026-10-16

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    Figure TWG2TA001081075_001
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    Figure TWG2TA001081075_002
  • Figure TWG2TA001081075_003
    Figure TWG2TA001081075_003
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Abstract

A brush cleaning system for cleaning a substrate includes a tank and a cylindrical roller disposed in the tank for cleaning the substrate. The cleaning system also includes a substrate holder for retaining the substrate in a vertical orientation and rotating the substrate. A movable substrate support is used to support the substrate in the tank.
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